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Providing a variety of solutions and services for contamination controls in semiconductor manufacturing
Providing a variety of solutions and services for contamination controls in semiconductor manufacturing
　
What's New
May 12, 2022 : Became a corporate member of the Hydrogenomics Alliance, Japan.
https://www.hydrogenomics-alliance.jp/overview04.html

List of Our Solutions

Product Name Feature Film Material Film Thickness Heat Resistant Temperature Corrosion Resistance Effect Example
Silica Coat
Quartzace		 Coating of metal surface with high-purity SiO2 equivalent to synthetic fused silica realizes metal contamination free surface. SiO2 0.7μｍ 350℃ HCl
HBr
etc.
※1		 Prevention of metal oxidation at high temperatures Reduction of metal contamination 
SPP Treatment Dense chromium oxide film formed on the surface of SUS316L provides excellent corrosion resistance even to HF and HCL. Cr2O3 40Å 300℃ HCl
HBr
HF
F2
etc.		 Reduction of metal contamination 
*1 Not applicable to HF, F2, or other F based gas

List of Our Solutions

Silica Coat Quartzace

Coating of metal surface with high-purity SiO2 equivalent to synthetic fused silica realizes metal contamination free surface.

SPP Treatment

Dense chromium oxide film formed on the surface of SUS316L provides excellent corrosion resistance even to HF and HCL. 

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